| abstract |
And a gas barrier laminate film excellent in impact resistance when the different layer is provided on the thin film layer. The present invention relates to a laminated film comprising a flexible substrate and a thin film layer formed on at least one surface of the substrate, wherein the thin film layer contains Si, O and C, and the X-ray photoelectron spectroscopy , The atomic ratio of C to Si calculated using a peak corresponding to the binding energy of each of 2p of Si obtained from the wide scan spectrum, 1s of O, 1s of N and 1s of C is calculated by the following equation 1), and when the infrared ray spectroscopy is performed on the surface of the thin film layer, the peak intensity I 1 existing at 950 to 1050 cm -1 and the peak intensity I 2 existing at 1240 to 1290 cm -1 ) Is in the range of the following formula (2). 0.01 < C / Si? 0.20 (1) I 2 / I 1 < 0.05 (2) |