| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2301-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F1-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F9-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F5-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F1-0059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B5-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F9-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F1-00 |
| filingDate |
2016-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_489fcf5eea5ba37d9b80763793c5bf58 |
| publicationDate |
2017-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170055002-A |
| titleOfInvention |
Copper particles, process for producing same, paste for forming conductive film, and article thereof |
| abstract |
An object of the present invention is to provide a copper particle which can provide a conductive film with little deterioration of the resistivity of the conductive film under high temperature and high humidity. Fatty acid and / or a copper particle having a surface that combines a fatty acid salt, the fatty acid and / or a combination of the fatty acid salt state is a peak intensity ratio P 1 of the 1530cm -1 in the IR analysis and diffusion, 2930cm - peak in the first And a peak intensity ratio to a strength P 2 : P 1 / P 2 is 0.15 to 0.45. |
| priorityDate |
2015-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |