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filingDate 2015-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20170048968-A
titleOfInvention Memory device and method of manufacturing the same
abstract A plurality of lower word lines extending in a first direction parallel to an upper surface of the substrate on the substrate; A plurality of common bit lines extending in a second direction different from the first direction and parallel to an upper surface of the substrate on the plurality of lower word lines; A plurality of upper word lines extending in the first direction on the plurality of common bit lines; A plurality of first memory cell pillars disposed at a plurality of intersections of the plurality of lower word lines and the plurality of common bit lines and each including a first select element having an ovonic threshold switching characteristic and a first memory layer, ; And a plurality of second memory cells, each of which is disposed at a plurality of intersections of the plurality of upper word lines and the plurality of common bit lines, each including a second selection element having an ovonic threshold switching characteristic and a second memory layer Wherein the plurality of first memory cell pillars and the plurality of second memory cell pillars have a symmetrical structure along a third direction perpendicular to the first direction around the plurality of common bit lines.
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