abstract |
The present invention relates to a method for the surface treatment of at least mainly a crystalline substrate surface (1o, 1o ') of a substrate (1, 1') by amorphizing the substrate surface (1o, 1o ' The amorphous layers 2, 2 ', 2 "are formed in the amorphous layers 2, 2', 2" and the amorphous layers 2, 2 ', 2 " The present invention also relates to a corresponding apparatus. |