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filingDate 2014-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a0b9d126c2418234755f3ca8dec2dad
publicationDate 2017-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20170023820-A
titleOfInvention Method and device for surface treatment of substrates
abstract The present invention relates to a method for the surface treatment of at least mainly a crystalline substrate surface (1o, 1o ') of a substrate (1, 1') by amorphizing the substrate surface (1o, 1o ' The amorphous layers 2, 2 ', 2 "are formed in the amorphous layers 2, 2', 2" and the amorphous layers 2, 2 ', 2 " The present invention also relates to a corresponding apparatus.
priorityDate 2014-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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