| abstract |
Provided are a resin composition for forming a lower layer film, a laminate, a pattern forming method, and a device manufacturing method capable of forming a lower layer film having good adhesiveness and excellent surface flatness. A resin having a group represented by the general formula (A) and a group represented by the general formula (B), and a solvent. R a1 represents a hydrogen atom or a methyl group, R b1 and R b2 each independently represent a group selected from a linear or branched unsubstituted alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, R b3 represents a group selected from a linear or branched unsubstituted alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring. |