http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170006807-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_021ebc8507967fb1cae5687eb8799eb4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate | 2015-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a62ebf6ce4a525b0e2fac0638378eca5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d4e6c2aa494c608b163de143748ee74 |
| publicationDate | 2017-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170006807-A |
| titleOfInvention | Component parts of process chamber and yttria deposition method on componet parts using chemical vapor deposition |
| abstract | The present invention relates to a component part of a process chamber and a method for depositing yttria on the same by chemical vapor deposition, and more specifically, to a component part of a process chamber and a method for depositing yttria on the same by chemical vapor deposition which coat yttria on a surface of a component part by chemical vapor deposition to prevent damage to the component part by a corrosive atmosphere in a semiconductor or a display process. The component part of a process chamber is exposed to a process environment under a plasma atmosphere or a corrosive gas atmosphere of a semiconductor or a display process, and comprises at least one among a metallic material, a ceramic material, and an alloy. A precursor which is a reaction source including yttrium and oxide including oxygen are used as reaction gas to deposit or coat a ceramic thin film on a surface or an edge of the component part by chemical vapor deposition to prevent corrosion or erosion of the component part in the process chamber. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220159864-A |
| priorityDate | 2015-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 64.