| abstract |
The present invention relates to a photoresist composition comprising (a) at least one alkali soluble polymer comprising at least one unit of the following structure (I), (b) at least one monomer of the following structure (II), and (c) ≪ / RTI > Wherein R 'is independently selected from hydrogen, (C 1 -C 4 ) alkyl, chlorine and bromine, m is an integer from 1 to 4, [In the formula, W is a polyvalent coupler, R 1 ~R 6 is hydrogen, hydroxy, (C 1 -C 20) alkyl, and is independently selected from chlorine, X 1 and X 2 is an oxygen or NR 7 independently (Wherein R 7 is hydrogen or (C 1 -C 20 ) alkyl), and n is an integer of 1 or more. The present invention also relates to a method of forming an image of a negative photoresist composition. |