| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1f548962093d468be111a5afcea9d1c3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2015-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c1d2eb0d0d428553e3402d3ea96452a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f4b2697a65a7de7672edae01cbd9b94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73ae9c16d9d970989aea1dd8e1198c3d |
| publicationDate |
2017-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170001850-A |
| titleOfInvention |
ETCHING SOLUTION FOR SiLICON NITRIDE LAYER |
| abstract |
The present invention relates to an etching solution for a silicon nitride film and, more specifically, to an etching solution having a higher etching selection ratio to a silicon nitride film than a silicon oxide film when wet-etching in a semiconductor manufacturing process. The etching solution for a silicon nitride film comprises: phosphoric acid; a silicon-based additive represented by chemical formula 1; and residual water. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190012043-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190005459-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019182277-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200124419-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210023552-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200001731-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190060324-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200007461-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190019719-A |
| priorityDate |
2015-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |