| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d825814c2847d297de844b4e7c60de4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_28ad23e752cf3d1a9bd9c35ecf2a5018 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2015-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_380c18419cef504987424b5fa15be0d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_419b9faa999fba5a3724365c09b15d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_818020b37c1344fad0593d25e8841f4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_040d24400d251fd205c15e9c79edc3a8 |
| publicationDate |
2016-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160150559-A |
| titleOfInvention |
Method for forming embossed pattern by laser direct writing and embossed pattern formed thereby |
| abstract |
The method of forming an angled pattern according to an embodiment of the present invention includes the steps of preparing a polymer membrane, forming a pattern protruding from the surface of the polymer membrane by irradiating the polymer membrane with a laser beam, It is possible to form a pattern by irradiating the surface of the polymer film with a thickness of less than a critical point where the polymer film is formed. |
| priorityDate |
2015-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |