http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160142540-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e11d38118509e1fbfb8f76182b378406 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate | 2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a393224c617e02b3914eaecbab73bbac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54cc11e35583738e77548d6784e3d58b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6394cc0a2cda2bf504ce1215bd368271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af3d322a74e943e30735036bfc7bf287 |
publicationDate | 2016-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20160142540-A |
titleOfInvention | Acrylic composition for photoresist fine pattern and method for preparing the composition and method for reducing pattern dimension in photoresist layer using the same |
abstract | The present invention is a technology regarding a composition for forming photoresist micropatterns which comprises a water-soluble polymer composition, a method for preparing the same, and a method for forming photoresist micropatterns using the same, and more specifically, to a composition for forming photoresist micropatterns; to a method for preparing the same; and a method for forming photoresist micropatterns using the same, whereby the dimension of a photoresist pattern can be reduced by coating the composition for forming photoresist micropatterns that comprises a water-soluble polymer of chemical formula 1 and a solvent on the photoresist pattern. |
priorityDate | 2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 74.