| abstract |
A novel photobase generator corresponding to formula (I) suitable for use in photoresists is provided: X 1 -R 1 -OC (= O) N (R 2 ) R 3 (I) Wherein X 1 is an optionally substituted aromatic group; R 1 is a linker; And R 2 and R 3 are the same or different optionally substituted linear, branched or cyclic aliphatic groups or optionally substituted aromatic groups, wherein at least one of R 2 and R 3 is an optionally substituted Branched alkyl group. |