| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0645 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate |
2015-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e6bf8efd4acdcd7d101de44740aefe6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1eb35ea8097b7f4aae3e5b56b4919d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fab9f2ba2020c3b34c4ed778b37b67c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d6b96bf1d1431d7d7e90b31515e0891
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4557ed6f4c4c30fe00fec68ca4ed30d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7a19e250cad1decd2be7bb0c7d1c929
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b6469bb63b1ebe353ab0efdc1b0ca9d |
| publicationDate |
2016-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160134441-A |
| titleOfInvention |
Multiple directed self-assembly patterning process |
| abstract |
A method for forming a target pattern for a semiconductor device using multiple directed self-assembly (DSA) patterning processes is disclosed. The method includes forming a guide pattern on a substrate by carrying out a process comprising the steps of: receiving a substrate; and performing a first DSA process. The method further includes performing a second DSA process on the substrate using the guide pattern. In an embodiment, the first DSA process controls the first pitch of the dense pattern in the first direction, and the second DSA process controls the second pitch of the dense pattern in the second direction. |
| priorityDate |
2015-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |