http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160126070-A

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filingDate 2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e27b43de747078a7efcbe2320b5ddfe0
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publicationDate 2016-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20160126070-A
titleOfInvention Infrared reflecting substrate and method for producing same
abstract The infrared ray reflective substrate 100 of the present invention has the first metal oxide layer 21, the second metal oxide layer 22 and the metal layer 30 in this order on the transparent substrate 10, The metal oxide layer 22 and the metal layer 30 are in direct contact with each other. The refractive index of the first metal oxide layer 21 is 2.2 or more. The second metal oxide layer 22 preferably contains tin oxide and zinc oxide and is composed of a metal oxide whose oxygen content is insufficient for the stoichiometric composition. The second metal oxide layer is preferably formed by the DC sputtering method. As the film formation of the second metal oxide layer, a target containing a zinc atom and a tin atom and having a metal oxide and at least one of zinc oxide and tin oxide sintered with a metal powder is preferably used. The oxygen concentration in the gas introduced into the sputtering film deposition chamber is preferably 8 vol% or less. According to the present invention, an infrared reflective substrate having high transmittance of visible light and excellent durability can be obtained.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190076961-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220070541-A
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type http://data.epo.org/linked-data/def/patent/Publication

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