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publicationDate 2016-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20160118357-A
titleOfInvention Method for manufacturing semiconductor device, substrate processing apparatus and recording medium
abstract A cycle of supplying a raw material containing a metal element and a halogen group to a substrate and a process of supplying an oxidant to the substrate are performed a predetermined number of times so that an oxide film containing a metal element is formed on the substrate In the step of supplying the oxidizing agent with the process, the catalyst is supplied to the substrate together with the oxidizing agent, and in the step of supplying the raw material, the catalyst is not supplied to the substrate.
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