| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F120-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate |
2015-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f15abea88572576cc528bffedcfcddc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_204204ac944eeab1a4a1267e1ffdc23d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4059b941b849f42d38970ce99448cfad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf2b79de9bae00c1b4a73941db3a5431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f694c27044096569595b635400d3b70 |
| publicationDate |
2016-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160111908-A |
| titleOfInvention |
(meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same |
| abstract |
The present invention provides a resist and a resist composition having high sensitivity and good balance without impairing basic physical properties such as resolution and line edge roughness (LER) as a chemically amplified resist. The present invention relates to a (meth) acrylate compound represented by the general formula (1), a process for producing the same, and a (meth) acrylic copolymer obtained by polymerizing the (meth) acrylate compound represented by the general formula (1) . [Chemical Formula 1] (Wherein R 1 is a hydrogen atom or a methyl group, R 2 is a linear or branched alkyl group having 2 to 4 carbon atoms, and R 3 is a group represented by the following formula (2) or (3) Lt; / RTI > (2) (3) (As described in the present specification for the formulas (2) and (3)). |
| priorityDate |
2014-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |