abstract |
(C) from 1 to 10% by weight of an inorganic acid, (d) from 0.5 to 3% by weight of a thiazole compound, based on the total weight of the composition, (G) 0.1 to 10% by weight of an organic acid or an organic acid salt, and (h) a residual amount of water. A metal film etchant composition and an etching method using the same. |