| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f94790cf5bf17ef5799ba79a953aa57 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02376 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 |
| filingDate |
2015-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebd0a2ed5fe08c04e6ee63ee4c8056e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60cdd6cf9aed7030e290e281e4085f4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc7f1533a62e24fdd08736bf9b984b84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa8441421a33dba325c3c66983380ae4 |
| publicationDate |
2016-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160103418-A |
| titleOfInvention |
Substrate disposition method |
| abstract |
An embodiment of a substrate processing method may include a temperature rising step of increasing temperature in a process chamber; an annealing step for heating a substrate for a thermal process; a gas introduction step of introducing a process gas into the process chamber; a carbon extraction step of extracting carbon atoms from the process gas; a recombination prevention step of preventing the recombination of the carbon atoms; and a diffusion step of diffusing the carbon atoms onto a substrate surface layer. So, the recombination between the carbon atoms can be prevented. |
| priorityDate |
2015-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |