| abstract |
The laminated film of the present invention is a laminated film having a substrate and a thin film layer and the thin film layer satisfying the following conditions (i) and (ii) (iii). (i) contains a silicon atom, an oxygen atom, a carbon atom and a hydrogen atom. (ii) a silicon distribution curve, an oxygen distribution curve and a carbon distribution curve showing the ratio of silicon atoms, oxygen atoms and carbon atoms to the total amount of each atom in the thickness direction, The carbon distribution curve has at least one extremum. (iii) In one thin film layer, the inside of the layer constitutes a plurality of layers having different densities, and the thickness of each layer is 10% or more of the thickness of the whole layer, and the layer A The density X of the layer A and the density Y of the layer B having the highest density satisfy the relation of the formula (1). X <Y (1) |