http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160101878-A

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filingDate 2016-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20160101878-A
titleOfInvention Substrate processing apparatus
abstract The supply flow path is branched into a plurality of upstream flow paths. The plurality of ejection openings are respectively arranged at a plurality of positions at different distances from the rotation axis. Hydrogen peroxide, which is one component of the chemical solution (SPM), is supplied to the upstream passage from the component liquid passage. The mixing ratio changing unit including the plurality of first flow rate adjusting valves and the plurality of second flow rate adjusting valves independently changes the mixing ratio of the sulfuric acid and the hydrogen peroxide solution contained in the chemical liquid discharged from the plurality of discharge ports to each of the upstream flow paths.
priorityDate 2015-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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