| abstract |
The present invention relates to a radiation-sensitive coloring composition capable of forming a coloring pattern in which contamination of a liquid crystal layer by a coloring agent is reduced, a coloring pattern formed of the radiation-sensitive coloring composition and a method of forming the same, Lt; / RTI > The present invention relates to a photocurable composition comprising a polymer, a photopolymerization initiator having two or more moieties represented by the following formula (1) in one molecule, and a photoacid generator comprising a colorant having a lactam structure, an isomeric ring structure, . It is preferable that the polymer has a cyclic ether group, a (meth) acryloyl group and the like. The present invention provides a method for producing a coated film, comprising the steps of forming a coating film on a substrate, irradiating a part of the coating film with radiation, developing the coating film irradiated with the radiation, The method comprising the steps of: (In the formula (1), R X represents a monovalent organic group). |