http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160087838-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8412303829f82505584efd929e126dd0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2033-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2035-0827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2105-0002 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C35-0805 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2014-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d44c8fc79594556d8c59b60f5af9b97 |
| publicationDate | 2016-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20160087838-A |
| titleOfInvention | Structure-manufacturing method using step-and-repeat imprinting technique |
| abstract | [PROBLEMS] To provide a method of manufacturing a structure capable of suppressing mask hardening erosion while minimizing the influence on the shape stability of a fine pattern transferred to a resin layer. [MEANS FOR SOLVING PROBLEMS] According to the present invention, there is provided a photocurable resin composition comprising a photopolymerizable monomer and a resin layer comprising a photocurable resin composition for imprint containing 0.1 part by mass or more of a photoinitiator and a polymerization inhibitor in 100 parts by mass of the monomer, And a step of pressing the fine pattern of the mold having a smaller area than the resin layer and having a fine pattern against the resin layer to form at least a region of the resin layer pressed by the mold A curing step of curing the exposed region portion of the resin layer by irradiating cured light to the resin layer, and a curing step of curing the exposed region portion of the resin layer, Curing portion and repeating the coating step and the curing step one or more times. Method is provided. |
| priorityDate | 2013-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.