| abstract |
An acid generator and a resist composition for use in a resist composition capable of producing a resist pattern with excellent line edge roughness. A salt represented by the formula (I), an acid generator containing the same, and a resist composition. [Wherein R 1 and R 2 are each independently a hydrogen atom, a hydroxyl group or a hydrocarbon group; m and n are each 1 or 2; Ar represents a phenyl group which may have a substituent; Q 1 and Q 2 are each a fluorine atom or a perfluoroalkyl group; A 1 is a single bond, an alkanediyl group having 1 to 24 carbon atoms, or the like; Y represents a hydrogen atom or an alicyclic hydrocarbon group, at least one of -CH 2 - in which the alicyclic hydrocarbon group has at least one substituent or is included in the alicyclic hydrocarbon group is -O-, -SO 2 - or -CO- .] |