| abstract |
A curable composition for optical imprinting excellent in ink jet suitability and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. A curable composition for optical imprinting comprising a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) represented by the general formula (I); In the general formula (I), A represents a 2- to 6-valent polyvalent alcohol residue. p represents 0 to 2, q represents 1 to 6, p + q represents an integer of 2 to 6, and m and n each independently represent 0 to 20. The r in the formula (1) is 6 to 20. Each R independently represents an alkyl group, an aryl group, or an acyl group having 1 to 10 carbon atoms. r = (the total number of m) + (the total number of n) (1) |