Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
filingDate |
2014-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8ccbffb1b684714088f1e2433a98bb2 |
publicationDate |
2016-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20160047550-A |
titleOfInvention |
Method for forming resist pattern, and composition for forming resist pattern |
abstract |
A resist pattern forming method using a resist pattern forming composition containing at least a polymerizable monomer which is liquid at room temperature, an organic gelling agent and a photopolymerization initiator, comprising the steps of: preparing a composition for forming a resist pattern; A step of applying a composition on a substrate to form a coating film, a step of gelling the organic gelling agent in the coating film, and a step of patterning a coating film obtained by gelating the organic gelling agent. |
priorityDate |
2013-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |