http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160039559-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| filingDate | 2015-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_576420789874bef3d7c52b625b83ef2a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd817b3b4b7b6b42ab0ea6796adcec2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ec4bfef851aa40e4ba98b6811748d59 |
| publicationDate | 2016-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20160039559-A |
| titleOfInvention | Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process, and electric/electronic part-protecting film |
| abstract | The present invention provides a film which can easily form a pattern and which is excellent in various film properties, in particular, adhesion to a base material used for a circuit board, and is also excellent in reliability as an electric / electronic component, And a coating film for protecting electrical and electronic parts with high reliability and high reliability. In order to solve the above problems, (A) a silicone skeleton-containing polymer compound having a repeating unit represented by formula (1) and having a weight average molecular weight of 3,000 to 500,000, [Wherein R 1 to R 4 are monovalent hydrocarbon groups, m is 1 to 100, a, b, c and d are 0 or a positive number, and a + b> 0 and a + b + c + d = 1. X is a divalent organic group represented by formula (2), and Y is a divalent organic group represented by formula (3). (W, V is a divalent organic group, n, p is 0 or 1, R 5 to R 8 are an alkyl group or an alkoxy group, k and h are 0, 1 or 2.) (B) a polyhydric phenol compound, (C) a photoacid generator, and (D) Solvent And a chemically amplified positive resist composition comprising the chemically amplified negative resist composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180041593-A |
| priorityDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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