| abstract |
To provide a laminate capable of forming a good pattern on an organic semiconductor. The organic semiconductor film surface, when at least a resist film made of a water-soluble resin film and a chemically amplified photosensitive resin composition is exposed as a laminate having in this order, a chemically amplified photosensitive resin composition, at a wavelength of 365nm 100mJ / cm 2 or more to 80 mol % Of a photoacid generator, and the exposed portion is hardly soluble in a developer containing an organic solvent, whereby a mask pattern can be formed and used as a mask for etching after forming the mask pattern. |