| abstract |
It is an object of the present invention to provide a resin and a resist composition capable of producing a resist pattern having good storage stability (defect, shape). A resin (A1) having no acid labile group, a resin (A2) having an acid labile group, and a resin containing a structural unit having a cyclic ether and having a structural unit represented by the formula (a4) Composition. In the formula (a4), R 3 represents a hydrogen atom or a methyl group. R 4 represents a saturated hydrocarbon group having 1 to 24 carbon atoms and a fluorine atom, and the methylene group contained in the saturated hydrocarbon group may be substituted with an oxygen atom or a carbonyl group. |