| abstract |
(1) a step of forming a film using a sensitizing actinic ray-sensitive or radiation-sensitive resin composition; (2) a step of exposing the film with an actinic ray or radiation; and (3) Wherein the sensitizing actinic ray-sensitive or radiation-sensitive resin composition comprises a repeating unit having a specific structure having an aromatic ring, a repeating unit having a specific structure having an acid-decomposable group, and a repeating unit having a crosslinkable group (High resolving power and the like), a high roughness performance, and a high transparency in an ultrafine region (for example, a region with a line width of 50 nm or less) by a pattern forming method containing a resin having a repeating unit having a specific structure, A method of forming a pattern simultaneously satisfying film reduction abatement performance, high exposure latitude, and high dry etching resistance at a very high dimensional level, It provides a radiation-sensitive resin composition, and the resist film, and a manufacturing method thereof and an electronic device using the electronic device. |