http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160025610-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2014-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2623bf7cd466ba2673bd806aa4836f85 |
| publicationDate | 2016-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20160025610-A |
| titleOfInvention | Pattern formation method, pattern, and etching method, electronic device manufacturing method, and electronic device using same |
| abstract | (i) a step of forming a first negative pattern by performing the following step (i-1), the following step (i-2) and the following step (i- (i-1) an actinic ray-sensitive or radiation-sensitive resin composition (1) comprising a first resin on the substrate, the first resin having an increased polarity due to the action of an acid and reduced in solubility in a developer containing an organic solvent, To form a first film (i-2) a step of exposing the first film (i-3) a step of developing the exposed first film using a developing solution containing an organic solvent (iii) a step of embedding a resin composition (2) containing a second resin in a region of the substrate where the film portion of the first negative pattern is not formed to form a lower layer; (iv) (3) containing a third resin whose polarity is increased by the action of an acid and whose solubility in a developing solution containing an organic solvent is reduced, to form an upper layer , (v) exposing the upper layer, (vi) developing the upper layer using a developing solution containing an organic solvent, and forming a second negative pattern on the surface of the first negative pattern And (vii) a step of removing a part of the lower layer in this order, a fine pattern having a laminated structure of various shapes (for example, a hole diameter, a dot diameter, a space width, and a line width Etc A pattern formed therefrom, an etching method using the same, an electronic device manufacturing method, and an electronic device. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11656390-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190019710-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019035579-A1 |
| priorityDate | 2013-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 277.