| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 |
| filingDate |
2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afe27095ec1e40a4b5e1b0c5cce537c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b36ce427d74f920b6e6a3cdd1501031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc8539ea6bc50952a1eb7cb3a7df0941
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7da12f3d8fd9b63d16570869063d5c3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcd24ba189e83de771b72780606da17a |
| publicationDate |
2016-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160020894-A |
| titleOfInvention |
Method of manufacturing semiconductor device |
| abstract |
In the method of manufacturing a semiconductor device, an inner mask layer containing a polymer is formed on the corneal epithelium. A porous film covering the inner mask layer is formed on the corneal epithelium. A source of acid is supplied to the outer surface region of the inner mask layer through the porous membrane. An acid source is used to induce the chemical reaction of the polymer contained in the inner mask layer in the outer surface region. The chemically reacted portions of the inner mask layer are removed to form an inner mask pattern. At least part of the porous film and the inner mask pattern are used as an etching mask to etch the corneal epithelium. |
| priorityDate |
2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |