http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160020696-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_397a4bb92cb7309e44a8eafeeb46ae1c |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2203-04103 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B5-14 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 |
filingDate | 2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a72d97ce64f145caa61711902fa5d37b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7cc6d4356d96383915ad12843c45933 |
publicationDate | 2016-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20160020696-A |
titleOfInvention | Transparent conductive film where multi-layer thin film is coated |
abstract | The present invention relates to a transparent conductive film of a multilayer thin film structure having a low surface resistance and high light transmittance. More particularly, the present invention relates to a method of forming a thin film by depositing 1 to 5 oxide layers, 1 metal layer, and 1 to 5 oxide layers on a substrate by applying a plasma ion implantation to the substrate to improve bonding force between the substrate and the thin film layer, To a transparent conductive film coated with a multilayer thin film having a light transmittance improved and a surface resistivity reduced by controlling the ratio of the thickness of the other oxide layer to the thickness of the layer in the range of 1: 1.1 to 1: 3.5. The oxide layer or the metal layer laminated using the sputtering method has a disadvantage in that the structure is not dense and the resistance is high and the light transmittance is low. In the present invention, at least one of the oxide layer and the metal layer is irradiated with a white flash (xenon lamp) by a xenon lamp to increase the density of the structure, thereby remarkably lowering the surface resistance, . Such a transparent conductive film is essentially used for electronic devices such as a flat panel display device, a solar cell, and a transparent touch panel. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108441833-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108441833-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114231903-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114231903-B |
priorityDate | 2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.