| abstract |
An alkoxysilylamine precursor having the formula (A) or (B) is described herein: Wherein R 1 and R 4 are each independently a linear or branched C 1 to C 10 alkyl group, a C 3 to C 12 alkenyl group, a C 3 to C 12 alkynyl group, a C 4 to C 10 cyclic alkyl Group, and a C 6 to C 10 aryl group; R 2, R 3, R 5, and R 6 are independently hydrogen, linear or branched C 1 to C 10 alkyl group, C 2 to C 12 alkenyl group, C 2 to C 12 alkynyl groups, C 4 to C 10 cyclic alkyl group, a C 6 to C 10 aryl group, and a linear or branched C 1 to C 10 alkoxy group. Also described herein are deposition methods employing one or more precursors having the chemical formulas A and / or B described herein. |