| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45582
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45519
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2015-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd3c2e483cae05ec199c3f676daf62f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c745cc5d8b5cba025d944e864981d9f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ace5e66a38b35b8135525e9108574d3a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf133a5d5829c70528974f99dfcb8f13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c77499bb17a75c6266165e6de69f06b |
| publicationDate |
2016-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160011567-A |
| titleOfInvention |
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium |
| abstract |
INDUSTRIAL APPLICABILITY The present invention improves the characteristics of a film formed on a substrate and processing uniformity within a substrate surface, and improves manufacturing throughput, thereby suppressing particle generation. A processing chamber in which a substrate is accommodated; A substrate support for supporting the substrate and including a projection on an outer periphery; A boundary plate that is provided in the process chamber and contacts the protrusion, and separates the process chamber from the transfer space for transferring the substrate; A gas supply unit for supplying a process gas to the process chamber; And a boundary purge gas supply unit for supplying a purge gas to the gap between the protruding portion and the boundary plate, which is generated when the process gas is supplied to the substrate. |
| priorityDate |
2014-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |