| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7886f9841c03e2449d28f454ebbe1dc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01014 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26506 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317 |
| filingDate |
2014-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ac9f4608cfc17fd1ea851605a075c48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6de48cc8c6099c875a289fae7e0fd81b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_117dddef92e1b987be801324ddd50e22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29fabcbbe0c6cf9a5a40b93b0cb0ea3f |
| publicationDate |
2016-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160009572-A |
| titleOfInvention |
Enriched silicon precursor compositions and apparatus and processes for utilizing same |
| abstract |
The present invention relates to isotope-rich silicon precursor compositions useful for enhancing the performance of ion implantation systems in ion implantation as compared to corresponding ion implantation lacking an isotope-rich silicon precursor composition. The silicon dopant composition is characterized in that at least one of 28 Si, 29 Si, and 30 Si comprises an isotope-rich one or more silicon compounds in excess of the natural abundance ratio and the supplemental gas comprising at least one of a subsidiary- . ≪ / RTI > Also disclosed is an ion implantation system comprising such a dopant gas supply as well as a dopant gas supply for providing such a silicon dopant composition to an ion implanter. |
| priorityDate |
2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |