http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160004200-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 |
| filingDate | 2015-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8630c62dea6ad9b2c3a8e129c90d798 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_424dbfcbafed8efc707b021e4a23ab93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bd13ff32daa2370bc084402364429fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df899713455e8af99dc2d2b739499fc8 |
| publicationDate | 2016-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20160004200-A |
| titleOfInvention | Polysiloxane composition for forming resist lower layer film and pattern forming method |
| abstract | [PROBLEMS] To provide a polysiloxane composition for forming a resist lower layer film and a pattern forming method using the polysiloxane composition for forming a resist lower layer that can suppress the occurrence of defects in a resist lower layer film in a multilayer resist process do. The present invention relates to a polysiloxane composition for forming a resist lower layer film containing a polysiloxane and an acid generator, wherein the acid generator comprises an onium cation and a acid anion, An aromatic ring structure having a chain substituent, or a combination thereof. The onium cation may include an alicyclic structure, an aliphatic heterocyclic structure, or a combination thereof. The sum of the atomic weights of the atoms constituting the acid anion is preferably 350 or less. |
| priorityDate | 2014-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.