| abstract |
(PROBLEMS) As a chemically amplified resist, there is provided a resist and a compound having good balance for improving sensitivity, resolution, and line edge roughness (LER) without impairing basic physical properties such as pattern shape, dry etching resistance and heat resistance do. (Meth) acrylic copolymer of an alicyclic ester compound represented by any one of the general formulas (1) to (3) and a (meth) acrylic copolymer of the general formula Sensitive resin composition. |