| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-482
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-0335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afe27095ec1e40a4b5e1b0c5cce537c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6135282078f13518b548191cf7847f0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd8e105d759556e725e86fb5fa5340da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc90cef43e01f47f5daf0b7c099c9cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ebd6076aad1c9a81691ef418df4dd7c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37a5b0d0f1ac139591a85cbedbc10ea5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3283ada98b9f4a7a7344db773e2ae1bc |
| publicationDate |
2015-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150143169-A |
| titleOfInvention |
Method of forming patterns and method of manufacturing integrated circuit device using the same |
| abstract |
A pattern forming method, and a method of manufacturing an integrated circuit element. In the pattern forming method, a photoresist pattern having a first opening exposing a first region of the cornea is formed. A capping layer is formed on the sidewalls of the photoresist pattern defining the first opening. The acid from the capping layer is diffused into the interior of the photoresist pattern to form an insoluble region around the first opening. A second opening is formed to expose the second region of the corneal epithelium by removing the soluble region spaced apart from the first opening with the insoluble region in between in the photoresist pattern. Use the insoluble area as an etch mask to etch the corneal epithelium. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10546810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190044320-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10937729-B2 |
| priorityDate |
2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |