| abstract |
(A) a sulfonium salt represented by the general formula (1), and (B) a repeating unit represented by the general formula (U-1), decomposing by the action of an acid, A chemically amplified resist composition comprising a polymer compound having increased solubility. (R 11 and R 22 is a monovalent hydrocarbon group. R 33 and R 01 is a hydrogen atom or a hydrocarbon group. K is 0~4, m is 0 or 1. R 101, R 102 and R 103 is 1 Represents a hydrocarbon group.) (q is 0 or 1, r is 0 to 2. R 1 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, R 2 is a hydrogen atom or an alkyl group, and B 1 is a single bond or an alkylene group. a? 5 + 2r-b, and b is an integer of 1 to 3.) [Effect] The resist composition of the present invention can impart a pattern having a very high resolution and a small LER in the microfabrication technique, particularly, the electron beam and the EUV lithography technique. |