http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150134950-A

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publicationDate 2015-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150134950-A
titleOfInvention Method of fabricating light emitting diode with high efficiency
abstract A method of manufacturing a high-efficiency light emitting diode is provided. Forming a p-type gallium nitride layer having a plurality of holes on the active layer, forming a p-type gallium nitride layer on the side surface of the p-type gallium nitride layer, And forming a metal layer filling the inside of the hole in which the insulating region layer is formed, wherein the metal layer is in the form of a metal disk layer, or the metal disk layer and the magnetic layer are sequentially The light emitting diode may be formed in a stacked manner. Accordingly, the present invention provides a method of forming a p-type gallium nitride layer having a plurality of holes by forming an insulating region layer in the p-type gallium nitride layer, thereby suppressing the decrease in the thin film quality of the gallium nitride layer or the generation of leakage current . Further, by forming a metal disk layer inside the gallium nitride layer, internal quantum efficiency of the light emitting diode can be effectively increased through surface plasmon resonance. In addition, by forming a magnetic layer in the gallium nitride layer, it is possible to apply a non-uniform magnetic field in the light emitting diode, thereby increasing the light emitting recombination rate and improving the luminous efficiency.
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