| abstract |
Provided are a pattern forming method, a composition kit, a resist film using the same, a method of manufacturing an electronic device, and an electronic device which are superior in sensitivity, resolution, LWR, and pattern shape in fine pattern formation with a line width of 60 nm or less. (i) a step of forming a film on a substrate by using a sensitive electron-sensitive or negative-acting ultraviolet resin composition, (ii) a topcoat composition containing a resin (T) having at least any one of the repeating units represented by the following general formulas (I-1) to (I-5) A step of forming a layer, (iii) a step of exposing the film having the topcoat layer using an electron beam or an extreme ultraviolet ray, and (iv) after the exposure, developing the film having the topcoat layer to form a pattern. |