| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f94790cf5bf17ef5799ba79a953aa57 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 |
| filingDate |
2014-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3e95695c38bbba6fe402b3f546b213e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39a184c1a4875b8306df7822b5b60c4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45cdddb400bee50bc189d69a993bbcf7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9586054cd9c72aab1a3b4b62f33ff885 |
| publicationDate |
2015-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150114056-A |
| titleOfInvention |
Substrate processing apparatus and method of forming a thin film and method of manufacturing a semiconductor device using the same |
| abstract |
The present invention relates to a method of manufacturing a semiconductor device, which comprises first and second process regions, first and second process regions for dividing the first and second process regions, and a second process region And a third processing region for performing plasma doping by introducing the first processing region, a thin film forming method and a semiconductor device manufacturing method using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018026524-A |
| priorityDate |
2014-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |