http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150111967-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-888 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3142 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-00 |
filingDate | 2014-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df4e0b18d97104845863c7a504771587 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ee1009c28746d7fff3df31df4c5aa88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1890251e6d94278e23bc9fdc92a484c |
publicationDate | 2015-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20150111967-A |
titleOfInvention | Surface nanofabrication methods using self-assembled polymer nanomasks |
abstract | The method of producing a nanofillated substrate surface comprises applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to the substrate surface. Wherein the amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a hydrophobic domain adjacent the substrate surface and a hydrophobic domain adjacent the substrate surface from the exposed surface of the self- A self-assembled polymer layer having hydrophilic domains extending into the assembled polymer layer is formed. At least a portion of the hydrophilic domain may be removed to form a plurality of pores at the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask to etch through the plurality of pores to form through holes. Nanofiller-forming material may be deposited on the substrate surface through the through-hole. The remaining portion of the self-assembled polymer layer may then be removed to expose the nanofillered substrate surface. |
priorityDate | 2013-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.