| abstract |
The present invention discloses cobalt-containing compounds, their synthesis, and their use for deposition of cobalt-containing films. The disclosed cobalt-containing compounds have one of the following formulas: Wherein each of R 1 , R 2 , R 3 , R 4 and R 5 is independently selected from the group consisting of hydrogen and a linear, cyclic or branched hydrocarbon group; (A) when R 1 and R 2 and R 3 are hydrocarbon groups, R 1 ≠ R 2 and / or R 3 ; (b) when R 3 is H, R 1 and R 2 are hydrocarbon groups; Or (c) when R 2 and R 3 are H, R 1 is a C 2 -C 4 hydrocarbon group. |