http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150106837-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_34c067d1bbfe85ac23d961d454a35d0e |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2015-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0619d833a87fdc011264234279b34c67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e9046290748b8e9ca12f9d0e6fa8f61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec45f95c5d46539afaf498d27826954d |
| publicationDate | 2015-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150106837-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | An object of the present invention is to provide a photosensitive resin composition capable of preventing deterioration of a line shape even if the exposure amount by the machine tool is the same as the exposure amount of the batch exposure without impairing the basic properties such as adhesion with a circuit pattern, . A photosensitive resin composition comprising (A) a carboxyl group-containing photosensitive resin, (B) a photopolymerization initiator, (C) an epoxy compound, and (D) Wherein the photopolymerization initiator (B) is an oxime ester compound having two or more carbazole skeletons in one molecule. |
| priorityDate | 2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 97.