http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150103210-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-44 |
| filingDate | 2014-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aedee7414180fb2af1605aa79345b279 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e6307e60d0c272b42ff076047754791 |
| publicationDate | 2015-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150103210-A |
| titleOfInvention | Photosensitive resin composition, production method for cured film using same, cured film, liquid crystal display device, and organic el display device |
| abstract | Provided is a photosensitive resin composition which can maintain high sensitivity and good chemical resistance and adhesion to a cured film. (a1) a polymer having a structural unit having a group protected with an acid-decomposable group and (a2) a structural unit having a crosslinkable group (excluding a block isocyanate group and an OH group), or a polymer having a structural unit (a1) (A1) and a structural unit (a2) among the polymer components, a polymer containing a polymer satisfying at least one of the structural unit (a2), a photoacid generator and a solvent, (a4) at least one structural unit having a block isocyanate group is contained in at least one of the polymer having a structural unit (a1) and the polymer having a structural unit (a2), or a structural unit and at least one polymer containing no structural unit (a1) and structural unit (a2). |
| priorityDate | 2013-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 255.