http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150096297-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57c2474c95c96995bd5f0603b3fcdd81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6789eaad6afecb6a0b147b31f29de05 |
| publicationDate | 2015-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150096297-A |
| titleOfInvention | Method of forming a pattern |
| abstract | It is possible not only to effectively block the OOB light by reducing the influence of the resist film on the environment, but also to reduce the film thickness of the resist pattern and reduce the bridge between the patterns, thereby improving the sensitivity of the resist and suppressing the generation of outgas from the resist film Provided is a pattern forming method for forming a negative pattern by development with an organic solvent using a resist protective film. A step of forming a resist protective film based on a polymer compound having a repeating unit of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group on a photoresist film formed on a substrate , An EUV exposure of an electron beam or a wavelength of 3 nm to 15 nm, and a step of forming a negative pattern in accordance with the development of the organic solvent developer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180041594-A |
| priorityDate | 2014-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 587.