| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2013-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a45868feafc870dc7c6c853310ded32f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bac32187258e85c36a05f8fdba4ef5e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_675371b1c7af7c068da26f78356bd092 |
| publicationDate |
2015-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150075521-A |
| titleOfInvention |
Photoresist stripper composition |
| abstract |
The present invention relates to a photoresist stripper composition comprising a compound represented by the general formula (1), an alkaline compound and a water-soluble organic solvent. The photoresist stripper solution composition of the present invention exhibits a corrosion-preventing effect on the copper metal without remaining on the surface of the substrate, and has no problem in electrical characteristics even after the completion of the process, and the problem of stain can be prevented. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180050836-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104950601-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104950601-B |
| priorityDate |
2013-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |