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publicationDate 2015-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150075374-A
titleOfInvention Methods of forming patterns
abstract Some embodiments include a method of forming a pattern. A first mask is formed over the material. The first mask defines a first pattern having features extending therein. The first pattern has a first level of uniformity over the distribution of features. A brush layer is formed in the feature across the first mask to narrow the feature to create a second mask from the first mask. The second mask has a second level of uniformity that is greater than the first level of uniformity over the narrowed feature. The pattern is transferred to the material through a second mask.
priorityDate 2013-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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