| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate |
2014-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d42314ec236f12df319ac1c19a0f3a94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f27e5e4efa9957769215fac9eeac0330
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27e6fda05f41c6e713aa86403e4d5d38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa68a4600470840e498817fb74cb4843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28c1bf2c100b55fc99af4b5e55b62fb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_511a72247fe96f6efb000292617247f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_815eecbd95c27371f74fa181d4076e5d |
| publicationDate |
2015-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150073108-A |
| titleOfInvention |
Composition for titanium nitride hard mask and etch residue removal |
| abstract |
The aqueous compositions of the present invention for stripping titanium nitride (TiN or TiNxOy) hardmasks and removing etch residues can be prepared by mixing a solvent, a weakly coordinated anion, an amine, and a trace amount of at least two non-oxidizing metal ions pH < / RTI > The aqueous compositions of the present invention contain no non-atmospheric oxidizing agent and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. The systems and methods of the present invention use an aqueous composition for stripping titanium nitride (TiN or TiNxOy) hardmasks and for removing titanium nitride (TiN or TiNxOy) etch residues. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180027638-A |
| priorityDate |
2013-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |