| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 |
| filingDate |
2014-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_733dae1f780fd4e50ea02d9295a9a017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d89996c4f28e48271d2f56e8afedd14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff49e4e574d14980fd707caf4645d177 |
| publicationDate |
2015-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150073092-A |
| titleOfInvention |
Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing touch panel |
| abstract |
The present invention relates to a resin composition comprising (A) a modified phenolic resin having an unsaturated hydrocarbon group, (B) a meta-paraquesol resin, (C) an orthocresol resin, and (D) (E): a silane compound having a skeleton of a polybasic acid or a skeleton of a polybasic acid anhydride, wherein the content of the component (E) is at least one kind selected from the group consisting of the components (A), (B) And less than 10 parts by mass based on 100 parts by mass of the total amount of the positive photosensitive resin composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180138211-A |
| priorityDate |
2013-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |